An aluminum film is formed as a photoreflective electrode at the side opposite to the light incident side of a solar cell by sputtering at a substrate temperature of 50.degree. to 200.degree. C. using a target of aluminum containing silicon as an impurity element at 0.1 to 6.0 weight %. An aluminum film or a silver film in which an impurity element is not added is formed on the above aluminum film, to obtain a texture structure having convex and concave shapes. When an organic resin film substrate is used, components (released as a gas by heating in a vacuum atmosphere) such as water within the organic resin film are removed after the aluminum film is formed.