A homogeneous compositions containing a fluorinated solvent, hydrogen fluoride, and an optional co-solvent, and the use of these compositions for etching of microelectromechanical devices is described.

Wordt de homogene samenstellingen die een fluorinated oplosmiddel, waterstoffluoride, en een facultatief mede-oplosmiddel, en het gebruik van deze samenstellingen voor ets van microelectromechanical apparaten bevatten beschreven.
 
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