A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200.degree. C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.

 
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< Microporous and mesoporous silicoaluminate solid, process for preparation, use as a catalyst and for hydrocarbon conversion

< Method for increasing the lifetime of stretford solution

> Suppression of methanation activity by a water gas shift reaction catalyst

> Methods of producing substantially anatase-free titanium dioxide with silicon halide addition
~ 00070