Ridge waveguide type semiconductor laser device

   
   

Provided is a ridge waveguide type semiconductor laser device in which fundamental transverse mode operation is stabilized and unstable jumps of a longitudinal mode (oscillation wavelength) never occur even with use of high optical output of 300 mW or more. The semiconductor laser device has a stacked structure composed of a substrate and layers thereon. The layers include a lower cladding layer, lower optical confinement layer, active layer, upper optical confinement layer, and upper cladding layer, which are built up in the order named. A ridge is formed on the upper cladding layer. The width (W) of the bottom ridge portion of the ridge ranges from 2.5 .mu.m to 5.0 .mu.m, and the distance from the bottom ridge portion to an active layer is adjusted to a value higher than 0.5 .mu.m and not higher than 0.8 .mu.m.

 
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