Process of forming thin film and precursor for chemical vapor deposition

   
   

A process of producing a strontium titanate, barium titanate or barium strontium titanate thin film by chemical vapor deposition which comprises using a titanium compound represented by formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group; and R.sup.2 and R.sup.3 each represent a methyl group or an ethyl group, or R.sup.2 and R.sup.3 are connected together to form a methylene group, a methylmethylene group or a dimethylmethylene group.

Un proceso de producir un titanate del estroncio, un titanate del bario o una película fina del titanate del estroncio del bario de la deposición de vapor químico que abarca con un compuesto titanium representó por el fórmula (i): ## del ## STR1 en donde R.sup.1 representa un átomo del hidrógeno o un metílico agrupe; y R.sup.2 y R.sup.3 cada uno representan a un grupo metílico o a grupo ethyl, o R.sup.2 y R.sup.3 están conectados juntos para formar un grupo del metileno, un grupo del methylmethylene o un grupo del dimethylmethylene.

 
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