Titanium target for sputtering

   
   

A titanium sputtering target that contains a concentration of oxygen in an amount of 20 ppm or less and has a maximum grain diameter of 20 .mu.m or less. The target permits a sputtering operation to be accomplished substantially free from the formation of particles or the occurrence of an abnormal discharge phenomenon. In addition, the target contains a reduced amount of contaminants and is soft.

Una blanco titanium de la farfulla que contiene una concentración del oxígeno en una cantidad de 20 PPM o menos y tiene un diámetro máximo del grano del mu.m 20 o de menos. La blanco permite que una operación de la farfulla esté substancialmente libre logrado de la formación de partículas o de la ocurrencia de un fenómeno anormal de la descarga. Además, la blanco contiene una cantidad reducida de contaminantes y es suave.

 
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