A system is provided in which an expanded non-collimated source of light
may be used to produce a uniform polarized light exposure for use, for
example, in the photo alignment of optical films. Uniformity of
polarization and intensity may be maintained even when a high-intensity
source of ultraviolet light is used. The system may be scaled in size to
produce large exposures without sacrificing uniformity of intensity of
uniformity of direction of polarization. The system includes a light
source, a pile-of-plates polarizer, and a surface (such as the surface of
an optical film) to be exposed. The pile-of-plates polarizer is oriented
orthogonally to the surface, thereby providing a polarized light exposure
having a uniform direction of polarization on the exposed surface. The
light source may be oriented at Brewster's angle to the polarizer to
improve polarization contrast.
