The invention provides a UV below 200 nm lithography method utilizing mixed
calcium strontium fluoride crystals. The invention includes providing a
below 200 nm radiation source for producing <200-nm light, providing a
plurality of mixed calcium strontium cubic fluoride crystal optical
elements, with the fluoride crystals comprised of a combination of calcium
strontium cations having different optical polarizabilities such as to
produce an overall isotropic polarizability which minimizes the fluoride
crystal spatial dispersion below 200 nm, transmitting <200-nm light
through the cubic fluoride crystal optical elements, forming a lithography
pattern with the light, reducing the lithography pattern and projecting
the lithography pattern with the fluoride crystal optical elements onto a
UV radiation sensitive lithography printing medium to form a printed
lithographic pattern. The invention includes making the mixed fluoride
crystals, optical element blanks thereof and optical lithography elements.
De uitvinding verstrekt UV onder de methode die van de 200 NMLITHOGRAFIE gemengde het fluoridekristallen gebruikt van het calciumstrontium. De uitvinding omvat het verstrekken van a onder de bron van de 200 NMSTRALING voor het produceren
