The present invention pertains to methods and apparatus for removal of one
or more solutes from a supercritical process solution. Solute additives
and contaminants are removed from supercritical processing solutions via a
contaminant removal system that is either part of the process vessel
itself or is part of a local recirculation loop in fluid communication
with the process vessel. This invention provides supercritical processing
methods and apparatus for the removal of additives and contaminants during
circulation so that depressurization and substrate removal can occur
without contamination. The removal in some cases, for example cleaning
residue, can be done continuously during a process to improve its
efficiency. Removal mechanisms may include separation, destruction,
conversion of the contaminant to acceptable species, or combinations
thereof.
