A vaporizing apparatus and method for providing a vaporized liquid
precursor to a process chamber in a vapor deposition process includes a
microdroplet forming device for generating microdroplets from a liquid
precursor and a heated housing defining a vaporization zone having a vapor
flow path from the microdroplet forming device to the process chamber. The
vaporization zone receives the microdroplets and a heated carrier gas. The
heated carrier gas has a temperature so as to provide the primary source
of heat for vaporizing the microdroplets. The vaporized liquid precursor
is then directed to the process chamber from the heated vaporization zone.
