Surfaces containing high purity silica (silicon dioxide) exhibit high
loading potential for nucleic acids.
Formulations containing nucleic acids and materials which mask the
electrostatic interactions between the nucleic acids and surfaces are
disclosed. By masking the phosphate charges of the nucleic acids,
undesired interactions may be minimized or eliminated, thereby allowing
the covalent bonding of the nucleic acids to the surface to proceed. The
use of such formulations additionally minimizes nonspecific binding of the
nucleic acids to the surface. Examples of materials to be included in such
formulations include cations, xanthines, hexoses, purines, arginine,
lysine, polyarginine, polylysine, and quaternary ammonium salts.
As superfícies que contêm o silicone do purity elevado (dióxido do silicone) exibem o potencial elevado do carregamento para ácidos nucleic. Os formulations que contêm os ácidos nucleic e os materiais que mascaram as interações eletrostáticas entre os ácidos nucleic e as superfícies são divulgados. Mascarando as cargas do phosphate dos ácidos nucleic, as interações indesejadas podem ser minimizadas ou eliminado, desse modo permitindo que a ligação covalent dos ácidos nucleic à superfície prosiga. O uso de tais formulations minimiza adicionalmente o emperramento nonspecific dos ácidos nucleic à superfície. Os exemplos dos materiais a ser incluídos em tais formulations incluem cations, xanthines, hexoses, purines, arginina, lysine, polyarginine, polylysine, e sais de ammonium quaternary.
