A multi-layered unit according to the present invention includes a support substrate
formed of a silicon single crystal, a barrier layer formed of silicon oxide on
the support substrate, an electrode layer, which is formed of BSCCO (bismuth strontium
calcium copper oxide) having a stoichiometric composition represented by Bi2Sr2CaCu2O8,
having an anisotropic property and conductivity and enabling epitaxial growth of
a dielectric material containing a bismuth layer structured compound thereon and
is oriented in the c axis direction, and a dielectric layer formed by epitaxially
growing a dielectric material containing a bismuth layer structured compound having
a composition represented by SrBi4Ti4O15 on the
electrode layer and oriented in the c axis direction on the electrode layer.