A method, system, and apparatus for management of reaction loads in a lithography
system is described. An isolated structure is supported by a non-isolated structure.
The isolated structure supports a moveable stage. A linear motor includes a first
linear motor element and a second linear motor element. The first linear motor
element is coupled to the moveable stage. A plurality of parallel flexure plates
mount the second linear motor element on the isolated structure. A flexure rod
is coupled between the non-isolated structure and the second linear motor element.
