Sputtering targets and methods of making sputtering targets are described.
The method includes the steps of: providing a sputtering metal workpiece made of
a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain
a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece.
The sputtering targets exhibits a substantially consistent grain structure and/or
texture on at least the sidewalls.
