New etch barriers of indium-tin-oxide in the manufacturing process of thin film
transistor-liquid crystal display are self-assembled monolayers, such as n-alkylsilanes.
A typical process of applying a self-assembled monolayer is to ink a hydrolyzed
n-octadecyltrimethoxysilane solution on to a stamp and then to transfer the solution
onto ITO. The surface of the stamp may be polar enough to be wet with polar self-assembled
monolayer solutions of an akylsilane. A non-polar stamp surface may be treated
with oxygen plasma to obtain a wettable polar surface.
