An exposure apparatus for exposing a substrate in a vacuum atmosphere includes
vibration absorbing mounts that are disposed in a vacuum chamber in order to make
it possible to support at least one exposure structure in the vacuum atmosphere
with high precision. The at least one exposure structure includes at least one
of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration
absorbing mounts are formed using metallic bellows. By the vibration absorbing
mounts, the at least one exposure structure is supported in the vacuum chamber.
