Thin film magnetic head with track width restricting groove formed to fully reach lower core layer, and manufacturing method for the same
   
   

A stopper layer having an etching rate that is lower than a reactive ion etching rate of the insulating layer is provided between the lower core layer and the insulating layer. With this arrangement, a groove that fully reaches the lower core layer can be formed in the insulating layer, and a lower magnetic pole layer can be formed by being properly grown by plating in the groove.

 
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