A microfabrication process for preparing articles in which a precursor article
that includes (a) a substrate, (b) a first polymer layer overlying the substrate,
(c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask
layer overlying the second polymer layer, and (e) a photodefinable layer overlying
the metal hardmask layer is subjected to photolithographic imaging, developing,
and plasma etching steps to form an article that includes the substrate and portions
of the first polymer layer arranged in a pattern corresponding to the pattern of
the photomask used for photolithographic imaging.
