Apparatus and process for the abatement of fluorine and fluorine-containing
compounds from gases containing same, such as effluent gas streams from semiconductor
manufacturing operations, wherein a fluorocompound abatement medium is injected
into the fluorocompound-containing gas. The fluorocompound abatement medium comprises
at least one of steam, methane and hydrogen, with the proviso that when the fluorocompound
abatement medium contains methane and/or hydrogen, the injection of the fluorocompound
abatement medium is conducted under non-combustion conditions.
