The present invention relates to a delivery system for vaporizing and delivering
vaporized solid and liquid precursor materials at a controlled rate having particular
utility for semiconductor manufacturing applications. The system includes a vaporization
vessel, a processing tool and a connecting vapor line therebetween, where the system
further includes an input flow controller and/or an output flow controller to provide
a controlled delivery of a vaporizable source material to the vaporization vessel
and a controlled flow rate of vaporized source material to the processing tool.
