Method of manufacturing an electro-optical device

   
   

A pixel portion 100 of a liquid crystal display device includes a thin film transistor T including a gate electrode 13, a gate insulating film 16, a channel region 18, and source/drain regions 22, a source line (data) 26 for supplying current to the thin film transistor T and a pixel electrode 24. In the formation of a pixel circuit 100, a gate electrode 13, a gate insulating film 16, and the channel region 18 are firstly formed on a glass substrate 10. After the formation of the channel region 18 and the like, a polyimide film 20 surrounding the peripheries of the regions to be provide with the source/drain regions 22, the pixel electrode 24 and the source line 26 on a glass substrate 10 is formed. The regions surrounded with the wall of the polyimide film 20 are applied with a liquid material and subjected to a thermal treatment, thereby forming the element of the source/drain regions 22 and the like.

 
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