The present invention provides a process and apparatus for treating contaminated
gas. A contaminated gas containing volatile organic compounds is continuously introduced
into a reactor to allow the gas to contact a metal oxide catalyst and an oxidant
for a period of time. The concentration of the volatile organic compounds can be
thus reduced. The treated gas is then continuously emitted from the reactor. The
concentration of the organic compounds of the emitted gas and/or the concentration
of the oxidant are continuously monitored, and the oxidant feeding amount is controlled
according to the monitored concentration. By means of the process of the present
invention, volatile organic compound-containing waste gas with high humidity can
be effectively treated, and the utility rate of the oxidant can be increased.
