A method includes performing at least one process for forming a feature of a
semiconductor
device in accordance with an operating recipe. An electrical performance characteristic
of the feature is measured. The measured electrical performance characteristic
is compared to a target value for the electrical performance characteristic. At
least one parameter of the operating recipe is determined based on the comparison.
A system includes a process tool, a metrology tool, and a controller. The process
tool is configured to perform at least one process for forming a feature of a semiconductor
device in accordance with an operating recipe. The metrology tool is configured
to measure an electrical performance characteristic of the feature. The controller
is configured to compare the measured electrical performance characteristic to
a target value for the electrical performance characteristic and determine at least
one parameter of the operating recipe based on the comparison.
