The present invention relates to removal of subsurface contaminants and methods
of same. In more particular, but not by way of limitation, the present invention
relates to an integrated method for remediating subsurface contaminants through
the use of a low concentration surfactant solution (and methods of making and using
novel surfactant solutions) followed by an abiotic polishing process to thereafter
achieve a substantially reduced subsurface contaminant concentration that surfactant
flushing alone cannot achieve.
