PIPE STRUCTURE, ALIGNMENT APPARATUS, ELECTRON BEAM LITHOGRAPHY APPARATUS, EXPOSURE APPARATUS, EXPOSURE APPARATUS MAINTENANCE METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SEMICONDUCTOR MANUFACTURING FACTORY

A pipe structure includes a double pipe having a resin inner pipe and a resin outer pipe covering an outside of the inner pipe, and a discharge mechanism for discharging fluid in a space between the inner pipe and the outer pipe. The double pipe is used in a vacuum chamber having a vacuum atmosphere.