An exposure method includes the steps of acquiring information of an alignment
mark formed on an object to be exposed, by changing a value of a device parameter,
the information being used for an alignment between a reticle and the object, the
reticle forming a circuit pattern to be transferred to the object, and the value
being able to be set in an exposure apparatus, determining the value of the device
parameter of the exposure apparatus based on the information acquired in the acquiring
step, and transferring the pattern onto the object using the exposure apparatus
that sets the value of the device parameter, which has been determined.
