Embodiments of the present invention provide a developing method, which
can efficiently prevent the developing solution from remaining on the backside
surface of the wafer, so as to avoid the influence of the contamination on the
subsequent processes. In one embodiment, a developing method comprises providing
a wafer in a reaction space, wherein the wafer has an exposed photoresist thereon;
coating a developing solution on a surface of the wafer; rotating the wafer; rinsing
a normal surface and a backside surface of the wafer; and stopping rinsing the
normal surface of the wafer while keeping rinsing the backside surface of the wafer
for a specific time period.
