An electron beam exposure apparatus for controlling deflection timing of an electron
beam with high precision, including: a blanking-electrode array having a deflecting
electrode for deflecting an electron beam; a deflection timing control section
for outputting the control signal for controlling the blanking-electrode array;
a load circuit, of which the impedance is the same as that of the blanking-electrode
array, where the wire length between the deflection timing control section and
the load circuit is shorter than the wire length between the deflection timing
control section and the deflecting electrode of the blanking-electrode array; and
a switching section, connecting with the deflection timing control section, the
blanking-electrode array, and the load circuit, for switching the destination of
the control signal output from the deflection timing control section between the
blanking-electrode array and the load circuit.
