The invention provides an ultraviolet lithography method/system. The lithography
method and system include providing a below 200 nm radiation source, providing
a photolytically improved transmitting fused silica glass lithography optical element,
transmitting below 200 nm photons through said photolytically improved transmitting
fused silica glass lithography optical element to form a lithography pattern which
is reduced and projected onto a radiation sensitive lithography printing medium
to form a printed lithography pattern. Providing the photolytically improved transmitting
fused silica glass lithography optical element includes providing a photolytically
improved transmitting fused silica glass lithography optical element preform body
and forming the photolytically improved transmitting fused silica glass lithography
optical element preform into said lithography optical element.
