The present invention relates to a method for determining the precompensated
pattern of exposure doses of an electron beam required per pattern position to
obtain a desired pattern in a coating on a substrate, comprising the steps of:
determining a smearing function of the electron beam; determining a precompensated
pattern with the smearing function and the desired pattern, wherein the determination
is performed such that exposure doses contain almost exclusively positive values
and the exposure doses are smooth relative to each other.
