This invention is an apparatus for imaging metrology, which in particular embodiments
may be integrated with a processor station such that a metrology station is apart
from but coupled to a process station. The metrology station is provided with a
first imaging camera with a first field of view containing the measurement region.
Alternate embodiments include a second imaging camera with a second field of view.
Preferred embodiments comprise a broadband ultraviolet light source, although other
embodiments may have a visible or near infrared light source of broad or narrow
optical bandwidth. Embodiments including a broad bandwidth source typically include
a spectrograph, or an imaging spectrograph. Particular embodiments may include
curved, reflective optics or a measurement region wetted by a liquid. In a typical
embodiment, the metrology station and the measurement region are configured to
have 4 degrees of freedom of movement relative to each other.
