An overlay mark for determining the relative position between two or more successive
layers of a substrate or between two or more separately generated patterns on a
single layer of a substrate is disclosed. The overlay mark includes a plurality
of coarsely segmented lines that are formed by a plurality of finely segmented
bars. In some cases, the coarsely segmented lines also include at least one dark
field while being separated by a plurality of finely segmented bars and at least
one clear field. In other cases, the coarsely segmented lines are positioned into
at least two groups. The first group of coarsely segmented lines, which are separated
by clear fields, are formed by a plurality of finely segmented bars. The second
group of coarsely segmented lines, which are separated by dark fields, are also
formed by a plurality of finely segmented bars.
