Developing photoresist with supercritical fluid and developer

   
   

A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.

 
Web www.patentalert.com

< Thermogelling biodegradable aqueous polymer solution

< Therapeutic inhibitor of vascular smooth muscle cells

> Molecular computing elements, gates and flip-flops

> Fuel cells having silicon substrates and/or sol-gel derived support structures

~ 00197