Off-axis leveling in lithographic projection apparatus

   
   

In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.

 
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