A static random access memory (SRAM) device and a method of manufacturing the
same.
In one embodiment, the SRAM device includes: (1) a first bias voltage contact biasable
to a first potential, (2) a second bias voltage contact biasable to a second potential
that differs from the first potential and (3) a well having channels formed therein
and connected to one of said first and second bias voltage contacts based on a
transistor characteristic of said SRAM device that bears on static noise margin
(SNM) and write trip voltage Vtrip.