An array substrate for use in a liquid crystal display device is fabricated by
the steps of forming a buffer layer on a substrate; forming a polycrystalline-silicon
active layer on the buffer layer, the said active layer having an island shape;
forming a gate insulation layer on the buffer layer to cover the polycrystalline-silicon
active layer; forming a first metal layer on the gate insulation layer; forming
a second metal layer on the first metal layer; patterning the first and second
metal layer to form a gate electrode, a gate line and a gate shorting bar; forming
a source contact area and a drain contact area at both sides of the polycrystalline-silicon
active layer; forming an interlayer insulator on the gate insulation layer to cover
the patterned first and second metal layers; patterning the interlayer insulator
and the gate insulation layer so as to form a first contact hole to the source
contact area and the second contact hole to a drain contact area, patterning a
portion of the interlayer insulator on the gate shorting bar so as to form an etching
hole, eliminating a portion of the first layer of the gate insulation layer under
the etching hole, and forming a bridge portion in the second layer of the gate
insulation layer under the etching hole; forming a third metal layer on the gate
insulation layer and on the bridge portion; patterning the third metal layer so
as to form a source electrode and a drain electrode, and removing the bridge portion
when patterning the third metal layer; and forming a passivation layer on the interlayer
insulator and on the patterned third metal layer.