A method for manufacturing an optical waveguide device in accordance with the present invention includes the steps of depositing a lower cladding layer; coating a photoresist layer directly on the lower cladding layer; patterning the photoresist layer to create channels; depositing a core layer, wherein a first portion of the core layer is deposited inside the channels and a second portion overlays the patterned photoresist layer; removing the patterned photoresist layer and the second portions of the core layer overlaying the patterned photoresist layer; and depositing an upper cladding layer.

 
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< Electrochemical cell having a multiplate electrode assembly housed in an irregularly shaped casing

> Forming nanoscale patterned thin film metal layers

> Magnesium -boride superconducting wires fabricated using thin high temperature fibers

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