An apparatus comprising:
- (a) a substrate including a level intermediate region disposed between
a first end region and a second end region;
- (b) a first external member disposed circumferentially around the first
end region in a continuous manner and protruding above the level intermediate region,
thereby resulting in a deposition region including the surface of the first external
member covering the first end region, an optional exposed first end region portion,
and the intermediate region; and
- (c) a dip coated layer over the entire deposition region, wherein the
portion of the dip coated layer over the first external member and the optional
exposed first end region portion is formed prior to the portion of the dip coated
layer over the intermediate layer.
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