A board for an electronic device is provide comprising a substrate having an amorphous layer, a buffer layer formed on the amorphous layer, the buffer layer having an orientation at least in the direction of its thickness, and a conductive oxide layer formed on the buffer layer by means of epitaxial growth, the conductive oxide layer having a metal oxide of a perovskite structure. The buffer layer contains at least one of the group consisting of a metal oxide of a NaCl structure and a metal oxide of a fluorite structure. Furthermore, the buffer layer 12 is formed by epitaxial growth in the cubic crystal (100) orientation.