The present invention provides a composition comprising:
(a) thermosetling component comprising (1) optionally at least one monomer
of Formula I as sel forth below and (2) at least one oligomer or polymer of Formula
II set forth below where E is a cage compound (defined below); each Q is the same
or different and selected from hydrogen, aryl, branched aryl, and substituted aryl
wherein the substituents include hydrogen, halogen, alkyl, aryl, substituted aryl,
heteroaryl, aryl ether, alkenyl, alkynyl, alkoxyl, hydroxyalkyl, hydroxyaryl, hydroxyalkenyl,
hydroxyalkynyl, hydroxyl, or carboxyl; Gw is aryl or substituted aryl
where substituents include halogen and alkyl; h is from 0 to 10; i is from 0 to
10; j is from 0 to 10; and w is 0 or 1;
adhesion promoter comprising compound having least bifunctionality wherein
the bifunctionality may be the same or different and the first functionality is
capable of interacting with the thermosetting component (a) and the second functionality
is capable of interacting with a substrate when the composition is applied to the
substrate. The present compositions may be used as a dielectric substrate material,
etch stop, hardmask, or air bridge in microchips, multichip modules, laminated
circuit boards, or printed wiring boards. The present composition may also be used
as a passive coating for enveloping a completed wafer.
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