Techniques for fabricating a device include forming a fabrication layout,
such as a mask layout, for a physical design layer, such as a design for an integrated
circuit, and identifying evaluation points on an edge of a polygon corresponding
to the design layer for correcting proximity effects. Techniques include selecting
from among all edges of all polygons in a proposed layout a subset of edges for
which proximity corrections are desirable. The subset of edges includes less than
all the edges. Evaluation points are established only for the subset of edges.
Corrections are determined for at least portions of the subset of edges based on
an analysis performed at the evaluation points. Other techniques include establishing
a projection point on a first edge corresponding to the design layout based on
whether a vertex of a second edge is within a halo distance. An evaluation point
is determined for the first edge based on the projection point and characteristics
of the first edge. It is then determined how to correct at least a portion of the
edge for proximity effects based on an analysis at the evaluation point.