An exposure apparatus for exposing a substrate using a plurality of masters.
The
apparatus includes a stage being able to install at least one of the plurality
of masters, a first housing surrounding the stage, a second housing for stocking
at least one of the plurality of masters, the second housing being installed adjacent
to the first housing or installed in an interior of the first housing, the second
housing being allowed to communicate with the first housing, and a third housing
being installed between an inside space and an outside space of the first housing,
the third housing being different from the first and second housings. The first
and second housings are filled by an inert gas or are adapted to be evacuated.