A positive photoresist composition comprising:

    • (A) an oxime sulfonate compound represented by the specific formula,
    • (B) a resin comprising repeating units including a group represented by the specific formula and which increases the solubility in an alkaline developing solution by the action of an acid, and
    • (C) a fluoroaliphatic-group-containing polymeric compound containing repeating units derived from a monomer represented by the specific formula.

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