An optically recorded article comprising a pattern of isomerized material in two isomeric forms in a matrix, wherein one of the isomeric forms is capable of being converted to the other form by one-electron oxidation and wherein said matrix was polymerized in-situ.

 
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> Embedded etch stop for phase shift masks and planar phase shift masks to reduce topography induced and wave guide effects

> Article with optically modified cholesteric liquid crystal layer
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