New oxime sulfonate compounds of the formula (I) and (II), wherein R1
is C1-C12alkyl, C1C4haloalkyl, hydrogon,
OR9, NR10R11, SR12 or is phenyl which
is unsubstituted or substituted by OH, C1-C18alkyl, halogen
and/or C1-C12alkoxy; R2, R3, R4
and R5 are for example hydrogen or C1-C12alkyl;
R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl
or phenylsulfonyl; R6 is for example phenylenedisulfonyl or
diphenylenedisulfonyl; R7, R8 and R9 for example
are hydrogen or C1-C6alkyl; R10 and R11,
are for example hydrogen or C1-C18alkyl; R12 is
for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13,
or a group of formula A1, A2 or A3, R21 and R22 independently of one
other have one of the meanings given for R7; R23, R24,
R25 and R26 independently of one another are for example
hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or
N; and Z1 is CR22 or N; and Z1 is CR22 or
N; and Z1 is CH2, S, O or NR13 are particularly
suitable as photo-latent acids in resist applications.
##STR1##
