A static resistant reticle comprises a substrate and a patterning layer and is
covered by an antistatic conductive film of quaternary amine (R4N)+Cl-.
A pellicle structure comprising an optically transparent membrane tightly stretched
on a frame is also coated by an antistatic electro conductive film of a similar
material. The reticle with the pellicle form a shielded structure isolating the
reticle from ESD.
