This invention pertains to complex mixtures of the formula M is a metal having
a valence of from 2-6, L1 is an anionic ligand and L2 is a siloxide or silyl amide
ligand suited for producing stable thin-film metal silicates, v is equal to the
valence of the metal, and 0xv. The bonding is such that an M—O—Si
or an M—N—Si linkage exists, respectively, and the stability for the
complex is provided by the organic ligand. The invention also relates to a process
for preparing the metal siloxide complexes.
Thus, the complexes can be represented by the formulas
(R)mM—(O—SiR1R2R3)n
and
(R)mM—[N—(SiR1R2R3)y(R4)2- y]n
wherein M is a metal having a valence of 2-6, m and n are positive integers
and m plus n is equal to the valence of the metal M. The R type groups, i.e., R,
R1, R2, R3, and R4 represent an organo ligand.
