A method of crystallizing amorphous silicon is used for manufacturing an array
substrate having thin film transistors, pixel electrodes and an alignment key.
The method includes forming an amorphous silicon layer over a substrate, forming
an alignment key in the amorphous silicon layer, preparing a mask including pattern
portions and an alignment key pattern, disposing the mask over the substrate having
the amorphous silicon layer, wherein the alignment key pattern is aligned with
the alignment key, and applying a first shot of a laser beam to in the amorphous
silicon layer to form first polycrystalline silicon areas corresponding to the
pattern portions of the mask.