Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.


< Radiation curable aqueous compositions

< Monovinylarene/conjugated diene copolymers having lower glass transition temperatures

> Polyamide and resin composition

> Method for preparing a 7-quinolinyl-3,5-dihydroxyhept-6-enoate

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