Cyclic structure-bearing fluorinated monomers having formula (1) wherein Z is a divalent organic group containing a polymerizable unsaturated group are useful to produce polymers for the manufacture of radiation-sensitive resist compositions which are fully transparent to radiation having a wavelength of up to 300 nm and have improved development properties.

 
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< Silicon containing TARC / barrier layer

< Hydrophilic film, and planographic printing material, stain-preventative member and defogging member using the same

> Photosensitive lithographic printing plate

> Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same
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